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Research Areas: Brief Description of Research: High-quality Ge Epitaxy on Si by Nanoscale Heterojunction Engineering
- A Foundation for III-V and II-VI Integration: Our
research objective is to develop a comprehensive materials engineering
solution to integrate high-quality III-V and II-VI heteroepitaxial films
on Si, utilizing (1) properly sized Ge seeds (3 to 100 nm in width)
and (2) their fully coalesced film as an interlayer. To grow high-quality
Ge on Si, we manipulate the growth surface at the nanoscale to significantly
reduce the strain at the heterojunction. Our general engineering approach
is to insert a thin, perforated dielectric layer (2 to 12 nm wide openings
and 1 to 10 nm in thickness) between Ge and Si. This technique, as an
alterative to metamorphic growth and wafer bonding/cutting, is uniquely
different from the epitaxial lateral overgrowth in that the characteristic
dimension of the Ge-Si heterojunction ensures coherent Ge seed pads
and that the remaining interlayer serves as artificially introduced
dislocations that relieve the strain. UNM-650 US Patent application was filed on September
8, 2004. |
Representative Publications:
Qiming Li, Ying-Bing Jiang, Huifang Xu, Steve Hersee, and Sang
M. Han "Heteroepitaxy of high quality Ge on Si by nanoscale Ge seeds
grown through a thin layer of SiO2," Appl. Phys. Lett., 85(11), 1928
(2004) and Virtual Journal of Nanoscale Science & Technology, October
4 (2004).
Qiming Li, Sang M. Han, Steven R. J. Brueck, Stephen Hersee, Ying-Bing Jiang,
and Huifang Xu, "Selective growth of Ge on Si(100) through vias of SiO2
nanotemplate using solid source molecular beam epitaxy," Appl. Phys.
Lett., 83(24), 5032 (2003).
Henry Gerung, Scott D. Bunge, Timothy J. Boyle, C. Jeffrey Brinker, and Sang
M. Han, "Anhydrous Solution Synthesis of High-Quality Ge Nanocrystals
from the Germanium (II) Precursor Ge[N(SiMe3)2]2," Chem. Commun., 14,
1914-1916 (2005).
Madhava R. Kosuri, Roya Cones, Qiming Li, Sang M. Han, Bruce C. Bunker, and
Thomas M. Mayer, "Adsorption Kinetics of Alkanethiol Self-Assembly on
Ge(111)," Langmuir, 20(3), 835 (2004).
Madhava R. Kosuri, Henry Gerung, Sang M. Han, Bruce C. Bunker, and Thomas
M. Mayer, "Vapor-phase Adsorption Kinetics of 1 Decene on H-terminated
Si(100)," Langmuir, 19(22), 9315 (2003).
Henry Gerung, Jeffrey C. Brinker, Steve R. J. Brueck, and Sang M. Han, "In
situ real-time monitoring of profile evolution during plasma etching of mesoporous
low-dielectric-constant SiO2," J. Vac. Sci. Technol. A, 23(2), 347 (2005).
For Prospective Graduate Students
Prof. Han's group is looking for motivated graduate students
whose interest is in previously described research areas. The research project
is highly interdisciplinary, covering areas that range from materials science
& engineering, to micro-nanofabrication, to spectroscopy to bioseparation
& analysis. Prof. Han currently has three laboratories, housing an instrumentation
for time-resolved infrared spectroscopy during bioseparation and analysis;
a state-of-the-art scanning tunneling microscope; a molecular beam epitaxy
system adjoined with a surface analysis chamber; a plasma processing chamber
integrated with real time diagnostics; and a reactive ion etcher. He also
shares a laboratory that houses a scanning laser confocal microscope. Two
of the laboratories are located in the Center
for High Technology Materials that provide world-class facilities. Prospective
students who are interested in the described research projects are strongly
encouraged to apply for graduate
admissions. The graduate student admitted the Chemical Engineering PhD
Program will have his/her tuition waived, and s/he will receive a competitive
monthly stipend along with health insurance benefits. You can directly contact
Prof. Han for more information.